1.8519 | 31CrMoV9 +QT Long-term plasma-nitrided
Numeric designation | 1.8519 |
---|---|
Chemical designation | 31CrMoV9 |
State | +QT Long-term plasma-nitrided (42h) |
Etching | 3% Nital |
This classic nitriding steel was plasma-nitrided in a long-term process for 42 hours at 540 °C. A thin compound layer is present (average thickness: 8 µm). A thin compound layer (average thickness: 8 µm) is present. The dark etched diffusion layer is approx. 500 µm deep; nitride seams have formed along the grain boundaries. The microstructure consists of tempered martensite with some dark, C-rich segregation lines. The measurement of the nitriding depth in the course of hardness resulted in a NHD of 0.53 mm. The limiting hardness was 390 HV0.5.
- Pore line: only isolated pores
- Bond coat thickness VS | CLT: 8 µm
- NHD 390 HV0.5 = 0.53 mm